Semiconductor device and method for producing semiconductor device

A method for producing a semiconductor device, the method comprising:

• preparing an insulating substrate surrounded by a frame body having a wall surface, the insulating substrate having a first metal layer and a second metal layer on a surface, the second metal layer being located between the first metal layer and the wall surface;
• disposing a semiconductor chip including an electrode on the first metal layer;
• forming a first wire of a bonding wire on the electrode;
• forming an intermediate wire of the bonding wire, the intermediate wire extending in a first direction;
• and
• forming a second wire of the bonding wire on the second metal layer, the second wire extending in a second direction,
• wherein, viewing from a direction perpendicular to the surface of the insulating substrate, a second angle formed between the second direction and the wall surface is smaller than a first angle formed between the first direction and the wall surface.

A semiconductor device comprising:

• a frame body having a wall surface;
• an insulating substrate surrounded by the frame body, the insulating substrate having a first metal layer and a second metal layer on a surface, the second metal layer being located between the first metal layer and the wall surface;
• a semiconductor chip including an electrode and provided on the first metal layer;
• and
• a bonding wire having a first wire connected to the electrode, a second wire connected to the second metal layer, and an intermediate wire between the first wire and the second wire, the second wire including a first end and a second end, the first end being connected to the intermediate wire, the second end being opposite to the first end, both the first and second ends being in contact with the second metal layer,
• wherein, a distance between the first and second ends along a first direction that extends from the first end to the second end is greater than a distance between the first and second ends along a second direction perpendicular to the wall surface.