Back to results
US 12,690,416 B2Granted
Substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorTomohiro Takahashi
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeSCREEN Holdings Co., Ltd.
InventorTomohiro Takahashi
Estimating the term…
In substrate processing using the batch processing unit and the single substrate processing unit, the entire substrate processing is efficiently advanced. A substrate processing method includes: a process of calculating a required period of time that is a period of time taken for the substrates to complete the substrate processing in the single substrate processing unit according to a standby number that is a number of the substrates after being subjected to chemical liquid processing in the batch processing unit and before being subjected to drying processing in single substrate processing unit; and a process of controlling a start timing of the chemical liquid processing in the batch processing unit to make the required period of time shorter than a period of time taken for the chemical liquid processing in the batch processing unit.
A substrate processing method for performing substrate processing by using a batch processing unit that performs said substrate processing including chemical liquid processing on a plurality of substrates, and at least one single substrate processing unit that performs said substrate processing including drying processing on one of said substrates, the method comprising:
A substrate processing method for performing substrate processing by using a batch processing unit that performs said substrate processing including chemical liquid processing on a plurality of substrates, and at least one single substrate processing unit that performs said substrate processing including drying processing on one of said substrates, the method comprising:
Dependencies are inferred from the claim text.