Substrate processing apparatus and method for manufacturing semiconductor device
AssigneeKioxia Corporation
InventorsYosuke Maruyama, Takahiro Kawata, Satoshi Nakaoka
Life of this patent
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Abstract
A substrate processing apparatus includes: a processing tank configured to store a solution capable of processing a substrate; a supply configured to supply the solution to the processing tank; a holding member having an openable and closable support portion capable of sandwiching the substrate, the holding member configured to hold the substrate in the processing tank; a first drive mechanism configured to move the holding member in a first direction along a substrate surface; and a guide disposed between the support portion and the supply in the processing tank and configured to guide a rotational movement of the substrate in the first direction.
Claims10
A substrate processing system comprising:
- a substrate;
- a processing tank configured to store a solution capable of processing the substrate;
- a supply configured to supply the solution to the processing tank;
- a lifter having an openable and closable support portion capable of sandwiching the substrate, the lifter configured to hold the substrate in the processing tank;
- a first motor configured to move the lifter in a first direction that is aligned with a major surface of the substrate;
- and
- a guide disposed between the support portion and the supply in the processing tank and configured to guide a rotational movement of the substrate;
- wherein the guide has a first guide, a second guide, and a third guide between the first guide and the second guide, and wherein a distance from a left end portion of the first guide to a right end portion of the second guide is equal to or greater than a length of a circumference of the substrate, so as to rotate the substrate at least once.
Dependencies are inferred from the claim text.