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US 12,690,366 B2Granted
Display device and manufacturing method of display device
AssigneeMagnolia White Corporation
InventorYuko Matsumoto
Life of this patent
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Abstract
According to one embodiment, a manufacturing method of a display device includes preparing a processing substrate by forming a lower electrode, forming a rib, and forming a partition including a lower portion and an upper portion, forming an organic layer on the lower electrode, forming an upper electrode on the organic layer, forming a first transparent layer on the upper electrode, and forming a second transparent layer on the first transparent layer. The first transparent layer and the second transparent layer are formed of organic materials different from each other. A refractive index of the second transparent layer is less than a refractive index of the first transparent layer.
Claims18
A manufacturing method of a display device, comprising:
- preparing a processing substrate by forming a lower electrode above a substrate, forming a rib comprising an aperture overlapping the lower electrode, and forming a partition including a lower portion located on the rib and an upper portion located on the lower portion and protruding from a side surface of the lower portion;
- forming an organic layer on the lower electrode in the aperture;
- forming an upper electrode on the organic layer;
- forming a first transparent layer on the upper electrode;
- forming a second transparent layer on the first transparent layer;
- forming a sealing layer after forming the second transparent layer;
- forming a patterned resist on the sealing layer after forming the sealing layer;
- removing the sealing layer exposed from the resist by dry etching;
- and
- continuously removing the second transparent layer and the first transparent layer exposed from the resist by ashing, wherein
- the first transparent layer and the second transparent layer are formed of organic materials different from each other,
- a refractive index of the second transparent layer is less than a refractive index of the first transparent layer,
- in the forming the upper electrode, the upper electrode is in direct contact with the side surface of the lower portion of the partition,
- in the forming the first transparent layer and the second transparent layer, the first transparent layer and the second transparent layer expose a part of the upper electrode,
- in the forming the sealing layer,
- the sealing layer covers the second transparent layer on the partition, covers the second transparent layer immediately above the lower electrode and is in contact with the partition, and
- the sealing layer is in direct contact with the part of the upper electrode, the dry etching etches the part of the upper electrode after removing the sealing layer, and
- an etching rate of the dry etching of the upper electrode is lower than an etching rate of the dry etching of the sealing layer.
15 more elements
A manufacturing method of a display device, comprising:
- preparing a processing substrate by forming a lower electrode above a substrate, forming a rib comprising an aperture overlapping the lower electrode, and forming a partition including a lower portion located on the rib and an upper portion located on the lower portion and protruding from a side surface of the lower portion;
- forming an organic layer on the lower electrode in the aperture;
- forming an upper electrode on the organic layer;
- forming a first transparent layer on the upper electrode;
- forming a second transparent layer on the first transparent layer;
- forming a sealing layer after forming the second transparent layer;
- forming a patterned resist on the sealing layer after forming the sealing layer;
- removing the sealing layer exposed from the resist by dry etching;
- and
- continuously removing the second transparent layer and the first transparent layer exposed from the resist by ashing,
- wherein
- the first transparent layer and the second transparent layer are formed of organic materials different from each other,
- a refractive index of the second transparent layer is less than a refractive index of the first transparent layer,
- the sealing layer covers the second transparent layer on the partition, covers the second transparent layer immediately above the lower electrode and is in contact with the partition,
- the upper electrode is in direct contact with the side surface of the lower portion of the partition,
- a part of the upper electrode is exposed from the first transparent layer and the second transparent layer,
- the sealing layer is in direct contact with the part of the upper electrode,
- the dry etching etches the part of the upper electrode after removing the sealing layer, and
- the upper electrode has a higher resistance to the dry etching compared to the sealing layer.
16 more elements
A manufacturing method of a display device, comprising:
- preparing a processing substrate by forming a lower electrode above a substrate, forming a rib comprising an aperture overlapping the lower electrode, and forming a partition including a lower portion located on the rib and an upper portion located on the lower portion and protruding from a side surface of the lower portion;
- forming an organic layer on the lower electrode in the aperture;
- forming an upper electrode on the organic layer;
- forming a first transparent layer on the upper electrode;
- forming a second transparent layer on the first transparent layer;
- forming a sealing layer on the second transparent layer;
- forming a patterned resist on the sealing layer;
- removing the sealing layer exposed from the resist by dry etching;
- and
- continuously removing the second transparent layer and the first transparent layer exposed from the resist by ashing,
- wherein
- the first transparent layer and the second transparent layer are formed of organic materials different from each other,
- a refractive index of the second transparent layer is less than a refractive index of the first transparent layer,
- the upper electrode is in direct contact with the side surface of the lower portion of the partition,
- the upper electrode includes a first area and a second area,
- the first area of the upper electrode is covered with the first transparent layer and the second transparent layer,
- the second area of the upper electrode is not covered with the first transparent layer and the second transparent layer,
- the sealing layer is in direct contact with the second transparent layer, the second area of the upper electrode, and the side surface of the lower portion of the partition,
- the dry etching etches the second area of the upper electrode after removing the sealing layer, and
- the upper electrode has a higher resistance to the dry etching compared to the sealing layer.
17 more elements
Dependencies are inferred from the claim text.