Plasma activated fluid processing system

A plasma activated fluid processing system, comprising:

• an alternating current, AC, source operating between 10 KHz and 50 MHz;
• and
• one or more reaction chambers, wherein each reaction chamber of the one or more reaction chambers comprises a plurality of reaction electrodes and at least one corresponding ground electrode, wherein each reaction electrode and the at least one corresponding ground electrode are separated by a gap,
• wherein the AC source is electrically connected on one side to the at least one corresponding ground electrode in parallel and on another side to each reaction electrode of the plurality of reaction electrodes in parallel,
• wherein each of reaction electrode of the plurality of reaction electrodes includes a capacitor connected to ground,
• wherein an inductor is provided between each of the reaction electrodes and the AC source, and
• wherein a frequency of the AC source is near a resonance frequency of an inductor-capacitor circuit formed by the inductor and the respective capacitor for each reaction electrode of the plurality of reaction electrodes.