Measuring device, measuring method, and vacuum processing apparatus
AssigneeTokyo Electron Limited
InventorsAtsushi Sawachi, Ichiro Sone, Takuya Nishijima, Suguru Sato
Life of this patent
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Abstract
A measuring device for a vacuum processing apparatus including a processing chamber having a first gate for loading and unloading a substrate and a second gate different from the first gate is provided. The measuring device includes a case having an opening that is sized to correspond to the second gate of the processing chamber and is airtightly attachable to the second gate, a decompressing mechanism configured to reduce a pressure in the case, and a measuring mechanism accommodated in the case and configured to measure a state in the processing chamber through the opening in a state where the pressure in the case is reduced by the decompressing mechanism.
Claims18
A measuring device for measuring a state of a consumable member disposed in a plasma processing chamber of a plasma processing apparatus, the measuring device comprising:
- a first case having a depressurizable internal space;
- a measuring mechanism disposed in the first case and configured to measure a state of the consumable member under a reduced pressure environment;
- and
- a second case communicating with the first case through an openable shutter member, having an opening for connecting with a gate of the plasma processing chamber, being located between the first case and the plasma processing chamber, and having a depressurizable internal space,
- wherein the measuring mechanism includes a first arm that is configured to move into the plasma processing chamber through the opening and that is detachably provided within the first case.
A measuring device, comprising:
- a first case having a depressurizable internal space;
- a second case located between the first case and a plasma processing chamber, the second case having a depressurizable internal space;
- and a measuring mechanism disposed in the first case and configured to measure a state of a consumable member disposed in the plasma processing chamber through the second case under a reduced pressure environment, wherein the measuring mechanism includes a first arm that is configured to move into the plasma processing chamber through an opening and that is detachably provided within the first case.
A measuring device detachably attached to a plasma processing chamber, comprising:
- a first case having a depressurizable internal space;
- a second case communicating with the first case through an openable shutter member, having an opening for connecting with a gate of the plasma processing chamber, being located between the first case and the plasma processing chamber, and having a depressurizable internal space;
- a robot arm disposed in the first case;
- and a sensor attached to the robot arm, wherein the robot arm is detachably provided within the first case and configured to move the sensor into the plasma processing chamber under a reduced pressure environment, and wherein the sensor is configured to measure a consumption amount and/or a position of a ring disposed in the plasma processing chamber under the reduced pressure environment.
Dependencies are inferred from the claim text.