Transfer film, manufacturing method of laminate, laminate, and micro LED display element

A manufacturing method of a laminate using a transfer film,

• the transfer film comprising, in the following order:
• a temporary support;
• a photosensitive precursor layer of a light absorbing layer, and
• a photosensitive layer,
• wherein a thickness of the photosensitive layer is 3 μm or more, and
• the manufacturing method of a laminate, comprising:
• a bonding step of bonding the transfer film to a base material by bringing a surface of the transfer film on a side opposite to the temporary support into contact with the base material to obtain a precursor layer-attached base material including the base material, the photosensitive layer, the precursor layer of the light-absorbing layer, and the temporary support in this order;
• an exposing step of exposing the photosensitive layer and the precursor layer of the light-absorbing layer in the precursor layer-attached base material;
• and
• a developing step of developing the exposed photosensitive layer and the exposed precursor layer of the light-absorbing layer to form a light absorbing layer having a first opening portion penetrating in a thickness direction and a resin layer having a second opening portion penetrating in a thickness direction and communicating with the first opening portion,
• wherein the manufacturing method further includes, between the bonding step and the exposing step or between the exposing step and the developing step, a peeling step of peeling the temporary support from the precursor layer-attached base material,
• a light reflecting layer forming step of forming a light reflecting layer on an inner wall surface of the second opening portion of the resin layer, and
• in a case where the base material includes no light emitting element on an exposed surface exposed through the second opening portion, a light emitting element disposing step of disposing the light emitting element on the exposed surface.

A manufacturing method of a laminate using a transfer film,

• the transfer film comprising:
• a temporary support;
• and
• a photosensitive precursor layer of a light absorbing layer,
• wherein a thickness of the precursor layer of the light absorbing layer is 3 μm or more, and
• an optical density of the precursor layer of the light absorbing layer at a wavelength of at least one of 385 nm and 550 nm is 3.0 to 6.0, and
• the manufacturing method of a laminate, comprising:
• a bonding step of bonding the transfer film to a base material by bringing a surface of the transfer film on a side opposite to the temporary support into contact with the base material to obtain a precursor layer-attached base material including the base material, the precursor layer of the light-absorbing layer, and the temporary support in this order;
• an exposing step of exposing the precursor layer of the light-absorbing layer in the precursor layer-attached base material;
• and
• a developing step of developing the exposed precursor layer of the light-absorbing layer to form a light absorbing layer having an opening portion penetrating in a thickness direction,
• wherein the manufacturing method further includes, between the bonding step and the exposing step or between the exposing step and the developing step, a peeling step of peeling the temporary support from the precursor layer-attached base material,
• a light reflecting layer forming step of forming a light reflecting layer on an inner wall surface of the opening portion of the light absorbing layer, and
• in a case where the base material includes no light emitting element on an exposed surface exposed through the opening portion, a light emitting element disposing step of disposing the light emitting element on the exposed surface.

A transfer film comprising, in the following order:

• a temporary support;
• a photosensitive precursor layer of a light absorbing layer;
• and
• a photosensitive precursor layer of a light reflecting layer,
• wherein a thickness of the precursor layer of the light reflecting layer is 3 μm or more, and
• the precursor layer of the light reflecting layer contains hollow particles.

A transfer film comprising, in the following order:

• a temporary support;
• a photosensitive precursor layer of a light absorbing layer;
• an interlayer;
• and
• a photosensitive precursor layer of a light reflecting layer,
• wherein a thickness of the precursor layer of the light reflecting layer is 3 μm or more.