Cleaning apparatus and substrate processing apparatus

A substrate processing apparatus comprising a cleaning apparatus configured to clean a substrate and a substrate support that maintains the substrate in a horizontal state,

• wherein the cleaning apparatus comprises:
• a nozzle configured to spray cleaning liquid;
• a nozzle extension comprising a nozzle extension body having a first aperture at a first end coupled to the nozzle and a second aperture at a second end, the first aperture and the second aperture connected by a fluid passage in the nozzle extension body, the first aperture aligned with the nozzle and the second aperture for discharging a cleaning liquid, and the first aperture and the second aperture each having a respective normal direction oblique to each other;
• and
• a cover that encloses the second aperture to receive the cleaning liquid from the second aperture, and that comprises a first cover portion configured to cover at least a portion of a front surface of a substrate adjacent to a substrate edge, a second cover portion configured to cover at least a portion of a rear surface of a substrate adjacent to the substrate edge, which is an opposite side of the front surface of the substrate, and a third cover portion configured to cover at least a portion of a side surface of the substrate edge connecting between the front surface and the rear surface,
• wherein the cover comprises a placement groove configured to receive the substrate edge, the placement groove being surrounded by the first cover portion, the second cover portion and the third cover portion, and
• wherein the substrate support comprises a rotating support portion configured to rotate the substrate along a rotation axis in a horizontal plane.

A substrate processing apparatus comprising a cleaning apparatus for cleaning a substrate, a substrate support for supporting the substrate in a horizontal state, and a spray apparatus for spraying a spray liquid on the substrate,

• wherein the cleaning apparatus comprises:
• a nozzle configured to spray a cleaning liquid;
• a nozzle extension comprising a nozzle extension body having a first aperture at a first end coupled to the nozzle and a second aperture at a second end, the first aperture and the second aperture connected by a fluid passage in the nozzle extension body, the first aperture aligned with the nozzle and the second aperture for discharging the cleaning liquid, and the first aperture and the second aperture each have a respective normal direction oblique to each other;
• a cover that encloses the second aperture to receive the cleaning liquid from the second aperture, and that comprises a first cover portion configured to cover at least a portion of a front surface of a substrate adjacent to a substrate edge, a second cover portion configured to cover at least a portion of a rear surface of the substrate adjacent to the substrate edge, which is an opposite side of the front surface, and a third cover portion configured to cover at least a portion of a side surface of the substrate edge connecting between the front surface and the rear surface;
• and
• a discharge extension that is connected to the cover, and that includes a discharge path through which the cleaning liquid may pass,
• wherein the nozzle comprises an inner wall defining a cleaning liquid path through which the cleaning liquid is able to pass and an exterior wall surrounding the inner wall,
• wherein the inner wall further comprises an internal nozzle that communicates the cleaning liquid path with an outlet of the internal nozzle for ejecting the cleaning liquid,
• wherein a space is provided between the exterior wall and the inner wall,
• wherein the space between the exterior wall and the inner wall is configured to pass a gas therethrough and the internal nozzle is configured to cause a gas leaving the space to contact the cleaning liquid that is ejected from the outlet,
• wherein the nozzle extension body comprises a flow changing portion configured to change a flow direction of the cleaning liquid passing therethrough,
• wherein the first cover portion has a first cover hole formed therein, the second cover portion has a second cover hole formed therein, and the cover is configured to pass the cleaning liquid through the first cover hole and the second cover hole,
• wherein the cover comprises a placement groove configured to receive the substrate edge, the placement groove being surrounded by the first cover portion, the second cover portion and the third cover portion,
• wherein the discharge extension has an inclined structure to guide the cleaning liquid to pass through a lower side of the third cover portion based on a vertical direction of the front surface of the substrate, and
• wherein the substrate support comprises a rotating support portion configured to rotate the substrate about a rotation axis in a horizontal plane.