Substrate cleaning device and substrate cleaning method

A substrate cleaning device that cleans an upper surface and a lower surface of a substrate with use of a cleaning liquid, comprising:

• a first substrate holder that holds the substrate in a horizontal attitude while not rotating the substrate by abutting against a plurality of portions of an outer peripheral end of the substrate;
• a second substrate holder configured to contact a lower-surface center region of the substrate while holding and rotating the substrate;
• a first lower-surface liquid supplier configured to eject the cleaning liquid towards a bottom surface of the substrate when the substrate is held by said first substrate holder;
• a cleaning brush configured to come into contact with the lower surface of the substrate;
• a brush driver configured to press the cleaning brush against the lower surface of the substrate held by the first substrate holder and move the cleaning brush relative to the substrate held by the first substrate holder;
• and
• a controller, wherein
• the controller controls the first lower-surface liquid supplier to have the first lower-surface liquid supplier eject the cleaning liquid onto the bottom surface of the substrate such that some of the ejected cleaning liquid falls from the bottom surface onto the cleaning brush in order to wet the cleaning brush, wherein the controller controls the brush driver such that the wetted cleaning brush is moved into contact with the lower-surface center region of the substrate, and wherein, after the cleaning brush is used to clean the lower-surface center region of the substrate, the controller controls the second substrate holder to come into contact with lower-surface center region of the substrate such that the substrate can be rotated by the second substrate holder.