Projection device with an optimized emission point distribution based on an isoline configuration

A method for manufacturing an image projection device for projecting an image onto an eye, the device being defined in an orthogonal reference system (X,Y,Z) and comprising an emission surface S extending generally in the plane (X,Y) of said orthogonal reference system (X,Y,Z), the emission surface S comprising a stack of elements, said elements comprising a set of Mx waveguides gp, a set of Mx×My diffraction gratings rpq and a set of My electrodes eq, Mx and My being positive integers whose product Mx×My is strictly greater than 1, each diffraction grating rqp being positioned at the intersection of one of said waveguides gp and one of said electrodes ep so as to form an emission point EPpq for a light wave, said set of Mx waveguides gp being arranged in a waveguide configuration, and said set of My electrodes eq being arranged in an electrode configuration,

• the method comprising a phase of designing said device and a phase of physically manufacturing said device thus designed, wherein said design phase comprises a step consisting in determining said waveguide configuration or said electrode configuration, said determined configuration being a non-rectilinear isoline configuration defined in the plane (X,Y) defined by the emission surface S and generating an aperiodic distribution of the Mx×My emission points EPpq.