Gas chromatograph
AssigneeShimadzu Corporation
InventorDaiki Fukushima
Life of this patent
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Abstract
In a sample vaporization chamber, a liquid sample is vaporized therein to produce a sample gas. A split flow path is configured to discharge the sample gas in the sample vaporization chamber. A valve is provided in the split flow path and opens/closes to adjust a flow rate of the sample gas flowing through the split flow path. A filler material is provided at a filling position in the sample vaporization chamber or in the split flow path. The controller is configured to control a degree of opening of the valve so that when the sample gas in the sample vaporization chamber is discharged from the split flow path, a pressure in the sample vaporization chamber decreases at a pressure gradient smaller than a pressure gradient at which the filler material is displaced from the filling position.
Claims5
A gas chromatograph comprising:
- a sample vaporization chamber configured to vaporize a liquid sample to produce a sample gas;
- a split flow path configured to discharge the sample gas in the sample vaporization chamber;
- a valve provided in the split flow path, the valve being configured to open and close to adjust a flow rate of the sample gas flowing in the split flow path;
- a filler material provided at a filling position in at least one of the sample vaporization chamber and the split flow path;
- and
- a controller configured to control a degree of opening of the valve so that when the sample gas in the sample vaporization chamber is discharged from the split flow path, a pressure in the sample vaporization chamber decreases at a pressure gradient smaller than a pressure gradient at which the filler material is displaced from the filling position.
Dependencies are inferred from the claim text.