Measurement system for process monitoring
AssigneeHongik University Industry-Academia Cooperation Foundation
InventorJung Hwan Seo
Life of this patent
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Abstract
A measurement system for measuring a status of a process of a treatment apparatus for treating a component in a chamber to generate a gas mixture including gaseous phase materials includes a sampling unit configured to selectively communicate an exhaust pipe for discharging the gas mixture including the gaseous phase materials from the chamber to sample the gas mixture from the exhaust pipe as much as a predetermined time or a predetermined volume; and a detection unit configured to separate and detect the gaseous phase materials included in the gas mixture sampled by the sampling unit into substances.
Claims22
A measurement system for measuring a status of a process of a treatment apparatus for treating a component in a chamber to generate a gas mixture including gaseous phase materials, the measurement system comprising:
- a sampling unit configured to selectively fluidically communicate with an exhaust pipe for discharging the gas mixture including the gaseous phase materials from the chamber to sample a predetermined volume of the gas mixture or to sample the gas mixture from the exhaust pipe for a predetermined time;
- and
- a detection unit configured to separate and detect the gaseous phase materials included in the gas mixture sampled by the sampling unit into substances;
- wherein the exhaust pipe connects to a bypass pipe branching off from the exhaust pipe at a first branch point and reconnects to the exhaust pipe at a second branch point, and
- wherein the sampling unit is configured to selectively fluidically communicate with the bypass pipe and to selectively fluidically communicates the exhaust pipe.
A measurement system for measuring a status of a process of a treatment apparatus for treating a component in a chamber to generate a gas mixture including gaseous phase materials, the measurement system comprising:
- a sampling unit configured to selectively fluidically communicate with an exhaust pipe for discharging the gas mixture including the gaseous phase materials from the chamber to sample a predetermined volume of the gas mixture or to sample the gas mixture from the exhaust pipe for a predetermined time;
- and
- a detection unit configured to separate and detect the gaseous phase materials included in the gas mixture sampled by the sampling unit into substances;
- wherein the exhaust pipe includes an upstream exhaust pipe and a downstream exhaust pipe connected through a multi-port valve, and
- wherein the multi-port valve is configured to:
- perform a sampling connection operation to shut off fluid communication between the upstream exhaust pipe and the downstream exhaust pipe, and to communicate the upstream exhaust pipe with an inlet of the sampling unit and the downstream exhaust pipe with an outlet of the sampling unit, and
- perform a sampling shutoff operation enabling the upstream exhaust pipe to fluidically communicate with the downstream exhaust pipe, and to enable the exhaust pipe to fluidically disconnect from the sampling unit.
A measurement system for measuring a status of a process of a treatment apparatus for treating a component in a chamber to generate a gas mixture including gaseous phase materials, the measurement system comprising:
- a sampling unit configured to selectively fluidically communicate with an exhaust pipe for discharging the gas mixture including the gaseous phase materials from the chamber to sample a predetermined volume of the gas mixture or to sample the gas mixture from the exhaust pipe for a predetermined time;
- and
- a detection unit configured to separate and detect the gaseous phase materials included in the gas mixture sampled by the sampling unit into substances;
- wherein the exhaust pipe is connected to a pump to form a pressure for discharging the gas mixture from the chamber, and
- wherein an inlet and an outlet of the sampling unit selectively fluidically communicate with the exhaust pipe between the chamber and the pump.
Dependencies are inferred from the claim text.