Convective substrate cooling with minimal pressure change
AssigneeApplied Materials, Inc.
InventorWolfgang R. Aderhold
Life of this patent
Estimating the term…
Abstract
Embodiments of the present disclosure generally relate to a reflector plate assembly. The reflector plate assembly includes a reflector plate and a baffle. The reflector plate includes a gas conduit, a plurality of gas passages, a plurality of lift pin holes, and a gas inlet. The gas conduit includes a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit. The baffle is attached at a first end to a support base of an edge ring. The baffle is attached at a second end to the backside of the reflector plate. The baffle forms an opening in the backside of the reflector plate to the gas conduit.
Claims20
A reflector plate assembly, comprising:
- a reflector plate, the reflector plate comprising:
- a gas conduit;
- a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit;
- and
- a gas inlet;
- and
- a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit.
A processing chamber, comprising:
- an edge ring for supporting a substrate in the processing chamber, the edge ring comprising a support base;
- a heating apparatus spaced apart from a front side of a substrate;
- a reflector plate assembly spaced apart from a backside of a substrate, the reflector plate assembly comprising:
- a reflector plate, the reflector plate comprising:
- a gas conduit;
- a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit;
- and
- a gas inlet;
- and
- a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit.
A controller storing instructions that when executed by a computer processor, cause the controller to perform operations of:
- actuating components of a processing chamber between a processing position, a post-cooling position, and a transfer position, the processing chamber including:
- an edge ring for supporting a substrate in the processing chamber, the edge ring comprising a support base;
- a heating apparatus spaced apart from a front side of a substrate;
- a reflector plate assembly spaced apart from a backside of a substrate, the reflector plate assembly comprising:
- a reflector plate, the reflector plate comprising:
- a gas conduit;
- a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit;
- and
- a gas inlet;
- and
- a baffle, wherein the baffle is attached at a first end to a support base of an edge ring, and attached at a second end to the backside of the reflector plate and forming an opening in the backside of the reflector plate to the gas conduit;
- adjusting an actuator and gas flow controls based off one or more of sensor reading, a system model, and stored readings and calculations;
- and
- synchronizing a rate of expansion or contraction of the baffle with a flow of gas to or from the baffle.
Dependencies are inferred from the claim text.