Film of graphitic carbon nitride for photoanode and a method for forming the same
AssigneeCity University of Hong Kong
InventorsRuiqin Zhang, May Thawda Oo, Yanling Zhao
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Abstract
A method for forming a film of graphitic carbon nitride (g-CN) by way of thermal vapor condensation comprising the steps of: a) providing a solid-phase thiourea precursor and a solid-phase melamine precursor in a container; b) covering the container with a first substrate; and c) thermally generating a vapor-phase thiourea source and a vapor-phase melamine source from the solid-phase thiourea precursor and the solid-phase melamine precursor in an air environment thereby forming a layer of g-CN on the first substrate. A film of g-CN formed by the method is also addressed.
Claims25
A method for forming a film of graphitic carbon nitride (g-CN) by way of thermal vapor condensation comprising the steps of:
- a) providing a solid-phase thiourea precursor and a solid-phase melamine precursor in a container;
- b) covering the container with a first substrate;
- and
- c) thermally generating a vapor-phase thiourea source and a vapor-phase melamine source from the solid-phase thiourea precursor and the solid-phase melamine precursor in an air environment thereby forming a layer of g-CN on the first substrate;
- wherein the solid-phase thiourea precursor and the solid-phase melamine precursor are physically separated by a support substrate.
Dependencies are inferred from the claim text.