Distribution body for distributing a process gas for treating a substrate by means of the process gas

A distribution body for distributing a process gas relative to a substrate to treat the substrate by means of the process gas, comprising:

• a distribution plate,
• at least one gas inlet channel,
• a plurality of gas distribution channels, and
• a plurality of gas extraction channels,
• wherein the gas inlet channel extends from a lateral surface of the distribution plate to an interior of the distribution plate,
• wherein the gas distribution channels branch off from the at least one gas inlet channel and extend to a substrate-facing surface of the distribution plate to supply process gas to the substrate to be treated, wherein the gas distribution channels are directed essentially perpendicular to the substrate-facing surface,
• wherein the gas extraction channels extend from the substrate-facing surface to another surface of the distribution plate to convey gas away from the substrate,
• wherein openings of the plurality of gas distribution channels have a diameter larger than a diameter of openings of the plurality of gas extraction channels, and
• wherein a summation of cross sections of all openings of the plurality of gas distribution channels in the substrate-facing surface is essentially equal to or smaller than a summation of cross sections of all openings of the plurality of gas extraction channels in the substrate-facing surface.