Coating layer with slow SIO2 crystallization rate
AssigneeROLLS-ROYCE plc
InventorJun Shi
Life of this patent
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Abstract
An article having a coating system configured to inhibit or prevent crystallization of a thermally grown oxide (TGO) layer at the operating temperature of the article. An article includes a substrate defining a surface and a coating layer that includes a dopant configured to inhibit crystallization of a thermally grown oxide layer comprising amorphous silicon dioxide at an interface of the coating layer at the operating temperature of the article. The dopant includes an oxide or a nitride. By inhibiting or preventing TGO crystallization, the described coating systems may increase a useable life of the component.
Claims19
An article comprising:
- a substrate defining a surface;
- and
- a coating layer overlying the substrate, wherein the coating layer comprises a dopant configured to inhibit crystallization of a thermally grown oxide layer comprising amorphous silicon dioxide at an interface of the coating layer at an operating temperature of the article,
- wherein the dopant comprises both lanthanum oxide and silicon nitride, and wherein the dopant is included in the coating layer in a range of from about 1 weight percent to about 5 weight percent.
A gas turbine engine component comprising:
- a ceramic matrix composite (CMC) substrate defining at least a portion of the gas turbine engine component, wherein the CMC substrate comprises a silicon-containing material;
- and
- a coating layer overlying the CMC substrate, wherein the coating layer comprises a dopant configured to inhibit crystallization of a thermally grown oxide layer comprising amorphous silicon dioxide at an interface of the coating layer at an operating temperature of the gas turbine engine component,
- wherein the dopant comprises both lanthanum oxide and silicon nitride, and wherein the dopant is included in the coating layer in a range of from about 1 weight percent to about 5 weight percent.
A method comprising:
- depositing a coating layer formulation on a substrate defining a surface to form a coating layer,
- wherein the coating layer comprises a dopant configured to inhibit crystallization of a thermally grown oxide layer comprising amorphous silicon dioxide at an interface of the coating layer at an operating temperature of an article;
- wherein the dopant comprises both lanthanum oxide and silicon nitride, and wherein the dopant is included in the coating layer in a range of from about 1 weight percent to about 5 weight percent.
Dependencies are inferred from the claim text.