Substrate processing apparatus

A substrate processing apparatus comprising:

• a transport unit configured to transport substrates in one direction;
• a plurality of heating zones sequentially on the transport unit along the one direction;
• and
• at least one cooling zone on the transport unit along the one direction, the at least one cooling zone downstream of the plurality of heating zones,
• wherein the at least one cooling zone includes a frame, a first plate below the frame, and a second plate below the first plate and completely spaced apart from the first plate, the frame including an internal space and an opening at a bottom of the frame, the first plate includes a plurality of first holes and at least one first dam, the at least one first dam surrounding at least one of the plurality of first holes and protruding toward the internal space, the second plate includes a plurality of second holes and at least one second dam, the at least one second dam surrounding at least one of the plurality of second holes and protruding toward the internal space, the second plate being downwardly inclined from a central point toward an edge,
• the plurality of first holes are staggered with respect to the plurality of second holes in a vertical direction, and
• the second plate further includes depressions configured to collect liquefied fumes.

A substrate processing apparatus comprising:

• a frame with an opening at a bottom of the frame, the frame including an internal space;
• a first plate below the frame;
• and
• a second plate below the first plate and completely spaced apart from the first plate,
• wherein
• the first plate includes a plurality of first holes, and a plurality of first dams surrounding the plurality of first holes and protruding toward the internal space,
• the second plate includes a plurality of second holes, and a plurality of second dams surrounding the plurality of second holes and protruding toward the internal space,
• the plurality of first holes are staggered with respect to the plurality of second holes in a vertical direction,
• the second plate has a first region, and a second region outside the first region,
• a first distance from the first region to the first plate is less than a second distance from the second region to the first plate,
• the second plate further includes depressions configured to collect liquefied fumes, and
• the substrate processing apparatus further includes a suction unit configured to remove the liquefied fumes collected in the depressions.