Cleaning assembly
AssigneeDisco Corporation
InventorMasaru Nakamura
Life of this patent
Estimating the term…
Abstract
A cleaning assembly includes a substrate having a lower surface to be held on a holding unit disposed in a processing apparatus and a cleaning member disposed on an upper surface of the substrate. A suction surface of a conveying unit is cleaned by an action of the cleaning member in a state in which the cleaning assembly is held on the holding unit.
Claims10
A cleaning assembly for use in a processing apparatus including a holding unit that holds a workpiece, and a processing unit that processes the workpiece, the cleaning assembly comprising:
- a conveying unit that has a suction surface for holding the workpiece under suction and that conveys the workpiece;
- a substrate having a constant thickness and a lower surface which is held under suction on an upper surface of a chuck table of the holding unit, wherein the lower surface of the substrate is held in contacting relationship with the upper surface of the chuck table;
- and
- a cleaning member formed from a brush implanted in an upper surface of the substrate,
- wherein the suction surface of the conveying unit is cleaned by an action of the cleaning member in a state in which the cleaning assembly is held on the holding unit.
A cleaning assembly for use in a processing apparatus including a holding unit that holds a workpiece, and a processing unit that processes the workpiece, the cleaning assembly comprising:
- a conveying unit that has a suction surface for holding the workpiece under suction and that conveys the workpiece;
- a substrate having a constant thickness and a lower surface which is held under suction on an upper surface of a chuck table of the holding unit, wherein the lower surface of the substrate is held in contacting relationship with the upper surface of the chuck table;
- and
- a cleaning member disposed on an upper surface of the substrate,
- wherein the suction surface of the conveying unit is cleaned by an action of the cleaning member in a state in which the cleaning assembly is held on the holding unit, and
- wherein the cleaning member is formed with at least one suction hole, such that the cleaning assembly is conveyed to the chuck table by a conveying arm with an arm member and at least one suction member disposed at a tip part of the arm member, such that the at least one suction member is positioned at the at least one suction hole.
A cleaning assembly for use in a processing apparatus including a holding unit that holds a workpiece, and a processing unit that processes the workpiece, the cleaning assembly comprising:
- a conveying unit that has a suction surface for holding the workpiece under suction and that conveys the workpiece;
- a substrate having a constant thickness and a lower surface which is held under suction on an upper surface of a chuck table of the holding unit, wherein the lower surface of the substrate is held in contacting relationship with the upper surface of the chuck table;
- and
- a cleaning member formed from a sponge pad adhered to an upper surface of the substrate,
- wherein the suction surface of the conveying unit is cleaned by an action of the cleaning member in a state in which the cleaning assembly is held on the holding unit.
Dependencies are inferred from the claim text.