Methods and systems for substrate functionalization
AssigneeUltima Genomics, Inc.
InventorsWilliam Schulkins, Angela Stern, Florian Oberstrass
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Abstract
Provided herein are systems and methods for functionalizing a substrate. The method may comprise providing a substrate surface, wherein the substrate surface comprises a plurality of individually addressable locations, and exposing the substrate surface to a dose of organosilane vapor to generate a plurality of organosilane-functionalized locations on the substrate surface, wherein the plurality of organosilane-functionalized locations corresponds to at least a subset of the plurality of individually addressable locations. The dose of organosilane vapor may be provided at relatively low dose, in an example, at most about 1×1024 molecules per m2.
Claims15
A method of generating an organosilane-functionalized substrate, comprising:
- (a) providing a substrate;
- and
- (b) exposing said substrate to a plurality of doses of organosilane vapor to generate said organosilane-functionalized substrate, wherein a dose of said plurality of doses is at most 1×1024 molecules per square meter (m2) of a surface of said substrate wherein exposing said substrate to said plurality of doses of organosilane vapor provide a layer of organosilane functionalization with an average thickness of at least about 1.2 nanometers and a standard deviation of thickness measurements of at most about 1.0 nanometers.
Dependencies are inferred from the claim text.