Projecting apparatus, illumination system and light uniformization system thereof

A light uniformization system for uniformizing a plurality of first laser light beams from a light source module, the first laser light beams entering the light uniformization system along a first direction and exiting the light uniformization system along a direction parallel to the first direction to form an illumination light, the light uniformization system comprising:

• a lens array element comprising a first array region and a second array region connected to each other and arranged along a second direction,
• wherein the first array region comprises a first light incident surface, a first light exiting surface and a plurality of first micro lenses, and the first laser light beams enter the first array region through the first light incident surface along the first direction, pass through the first micro lenses and exit the first array region through the first light exiting surface to form a first light beam;
• wherein the second array region comprises a second light incident surface, a second light exiting surface and a plurality of second micro lenses, and the first light beam enters the second array region through the second light incident surface, passes through the second micro lenses and exits the second array region through the second light exiting surface to form a second light beam;
• wherein the first light incident surface and the second light exiting surface are located at a same surface of the lens array element, and the first direction is perpendicular to the second direction.