Plating apparatus, control method for plating apparatus and nonvolatile storage medium storing program

A plating apparatus comprising:

• a transfer device for transferring a substrate holder in a vertical direction and a transfer direction perpendicular to the vertical direction, the transfer device including an imaging device,
• a processing tank having an opening for the substrate holder to be put inside,
• a reference mark, and
• a control device that controls the transfer device and the imaging device, the plating apparatus having a first mode in which the control device is configured to execute a test at a test acceleration,
• the test including:
• controlling, by the control device, the imaging device to capture a reference image so that the opening and the reference mark are reflected, when the transfer device is located at a determination position directly above the processing tank;
• moving, by the control device, the transfer device from a reference position to the determination position so that the transfer device gripping the substrate holder decelerates at the test acceleration and stops at the determination position;
• controlling, by the control device, the imaging device to capture a comparison video so that the reference mark and a lower end portion of the substrate holder are reflected, when and after the transfer device stops;
• and
• determining, by the control device, whether the lower end portion of the substrate holder protrudes outside a region where the opening is extended in the vertical direction when and after the transfer device stops, based on the reference image and the comparison video, to determine that the test acceleration has an inappropriate value when the lower end portion protrudes outside the region, wherein the control device performs normal operation of the plating apparatus using the acceleration that is not determined to be the inappropriate value.