Exposure control method applicable to exposure fusion
AssigneeRealtek Semiconductor Corp.
InventorsXiao-Yu Chen, Gang Shen, Yang Lu, Dong-Yu He
Life of this patent
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AssigneeRealtek Semiconductor Corp.
InventorsXiao-Yu Chen, Gang Shen, Yang Lu, Dong-Yu He
Estimating the term…
An exposure control method includes: calculating a long-exposure brightness mean value of pixels of darker (N−X) kinds of brightness among N kinds of brightness values of a long exposure image, wherein a total number of pixels of brightest X kinds of brightness values among the N kinds of brightness values is a long-exposure bright pixel number; when the long-exposure brightness mean value doesn't approximate to a long-exposure target brightness mean value, adjusting exposure setting for generating/modifying the long exposure image to make the two brightness mean values be similar/equal; determining brightest K pixels of a short exposure image, wherein the K is equal to the long-exposure bright pixel number; calculating a short-exposure brightness mean value; and when the short-exposure brightness mean value doesn't approximate to a short-exposure target brightness mean value, adjusting exposure setting for generating/modifying the short exposure image to make the two brightness mean values be similar/equal.
An exposure control method, the method comprising:
An exposure control method, the method comprising:
Dependencies are inferred from the claim text.