Method of fabricating superconducting wire

A method of fabricating a superconducting wire, comprising:

• forming a buffer layer on the substrate, the buffer layer comprising an Y2O3 layer, the Y2O3 layer being formed by reactive magnetron sputtering in which second oxygen gas as reactant gas and a sputtering target made of yttrium metal are used, the Y2O3 layer being formed while being supplied the second oxygen gas at a second concentration, the second concentration being a concentration of the second oxygen gas at which an emission intensity of Y in plasma near a surface of the sputtering target is measured to be not less than 15% and not more than 90% of a first reference value, the first reference value being the emission intensity of Y at which a concentration of the first oxygen gas is zero;
• and
• forming a superconducting layer above the buffer layer.

A method of fabricating a superconducting wire, comprising:

• forming a buffer layer on the substrate, the buffer layer comprising an MgO layer, the MgO layer being formed by reactive magnetron sputtering in which third oxygen gas as reactant gas and a sputtering target made of magnesium metal are used and to which ion beam assisted deposition is applied, the MgO layer being formed while being supplied the first oxygen gas at a first concentration, the first concentration being a concentration of the first oxygen gas at which an emission intensity of Mg in plasma near a surface of the sputtering target is measured to be less than 50% of a first reference value, the first reference value being an emission intensity of Mg at which the concentration of the first oxygen gas is zero;
• and
• forming a superconducting layer above the buffer layer.