Apparatus and methods for heating tunability in processing chambers

A substrate processing chamber, comprising:

• a chamber body comprising a lid, a floor, and a processing volume disposed between the lid and the floor;
• an upper window disposed between the lid and the processing volume;
• a lower window disposed between the floor and the processing volume;
• a substrate support assembly disposed in the processing volume;
• a lamp head disposed between the lower window and the floor or between the upper window and the lid;
• a plurality of lamps disposed within the lamp head, the plurality of lamps comprising:
• at least one first lamp operating at a first wavelength;
• and
• at least one second lamp operating at a second wavelength different than the first wavelength
• a lens disposed between the lamp head and the lower window or between the lamp head and the upper window;
• and
• an actuation mechanism configured to shorten or lengthen a distance between the lamp head and the lens.

A method of heating a substrate, comprising:

• measuring a thermal intensity of a thermal profile, using a system of pyrometers, of an area of a substrate disposed on a substrate support proximate a lamp and a lens, the lens disposed between the lamp and the substrate support;
• determining if the thermal intensity is outside of desired parameters;
• and
• in response to the thermal intensity being outside of desired parameters, adjusting a focal length of a lens assembly using an actuation mechanism coupled to the lens assembly, wherein the actuation mechanism is configured to shorten or lengthen a distance between the lamp and the lens.