Hybrid X-ray and optical metrology and navigation
AssigneeTokyo Electron Limited
InventorsFrancisco Machuca, Vi Vuong, Andrej Mitrovic, Xinkang Tian, Holger Tuitje
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsFrancisco Machuca, Vi Vuong, Andrej Mitrovic, Xinkang Tian, Holger Tuitje
Estimating the term…
A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband optical beam within an optical field of view (FOV), illuminating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV, and concurrently acquiring X-ray metrology information, e.g., one or more X-ray images utilizing various modalities, such as absorption, phase contrast difference, darkfield, small angle X-ray scattering (SAXS) and/or fluorescence, from the X-ray FOV and a plurality of optical images of the optical FOV, each of the optical images corresponding to respective selected wavelengths of the broadband optical beam from each of ultraviolet, visible, and infrared wavelengths, for example including deep ultraviolet, near infrared, or short-wavelength infrared wavelengths. The DUT may be one or more substrates, e.g., stacked, and include electronic devices such as three-dimensional integrated devices.
A method of characterizing a device under test (DUT), the method comprising:
A system for characterizing a device under test (DUT), the system comprising:
A system for characterizing a substrate comprising:
Dependencies are inferred from the claim text.