Substrate temperature measuring device, substrate processing apparatus including the same, and substrate temperature measuring method using the same

A substrate temperature measuring device, comprising:

• a chamber which defines a processing space for processing a substrate;
• a temperature measurer positioned on an upper wall of the chamber and outside of the chamber, the temperature measurer being configured to measure a temperature of the substrate and comprising a first sub-measurer and a second sub-measurer spaced apart from each other;
• and
• a light source on an inner wall of the chamber and inside of the chamber, the light source being configured to emit a light,
• wherein each of the first sub-measurer and the second sub-measurer includes:
• a sensor configured to sense a first amount of light of a first light having a first wavelength, a second amount of light of a second light having a second wavelength, and a third amount of light of a third light having a third wavelength, which are provided from the substrate, the first wavelength, the second wavelength, and the third wavelength being different from each other and each being 1 μm or more and 2 μm or less,
• an optical system configured to adjust light received from the substrate so that its optical plane is aligned with an optical axis of the sensor, wherein the light from the substrate comprises the first light, the second light, and the third light,
• a first calculator configured to calculate a first temperature for the first wavelength,
• a second temperature for the second wavelength, and a third temperature for the third wavelength, based on the first amount of light, the second amount of light, and the third amount of light,
• a second calculator configured to calculate an emissivity of the substrate and a reflected energy of the substrate, based on the first temperature, the second temperature, and the third temperature, and to calculate a temperature of the substrate, based on the calculated emissivity of the substrate and the calculated reflected energy of the substrate,
• a transparent window positioned between the substrate and the sensor, wherein the sensor is disposed on a side of the transparent window opposite to the substrate,
• a splitter configured to separate received light into the first light, the second light, and the third light so that the sensor is positioned to receive the first light, the second light, and the third light from the splitter, and
• a body portion enclosing the sensor, the splitter, and the transparent window,
• wherein each of the first amount of light, the second amount of light and the third amount of light include an amount of emitted light emitted from the substrate and an amount of reflected light reflected from the substrate,
• wherein the amount of emitted light is determined by the emissivity of the substrate,
• wherein the amount of reflected light is determined by the reflected energy of the substrate,
• wherein the first sub-measurer is configured to measure a temperature of a first region of the substrate,
• wherein the second sub-measurer is configured to measure a temperature of a second region different from the first region of the substrate, and
• wherein the first wavelength, the second wavelength, and the third wavelength are different from each other.

A substrate temperature measuring device comprising:

• a sensor configured to sense a first amount of light of a first light having a first wavelength, a second amount of light of a second light having a second wavelength, and a third amount of light of a third light having a third wavelength which are provided from a substrate;
• a first calculator configured to calculate a first temperature for the first wavelength, a second temperature for the second wavelength, and a third temperature for the third wavelength, based on the first amount of light, the second amount of light, and the third amount of light sensed by the sensor;
• a second calculator configured to calculate an emissivity of the substrate and a reflected energy of the substrate, based on the first temperature, the second temperature, and the third temperature calculated by the first calculator, and to calculate a temperature of the substrate based on the emissivity of the substrate and the reflected energy of the substrate calculated by the second calculator,
• an optical system configured to adjust received light from the substrate so that its optical plane is aligned with an optical axis of the sensor;
• and
• a splitter configured to separate a main light from the optical system into the first light, the second light, and the third light,
• wherein the temperature of the substrate is calculated by repeating calculation performed by the first calculator and calculation performed by the second calculator, and
• wherein the first wavelength, the second wavelength, and the third wavelength are different from each other and are 1 μm or more and 2 μm or less, and
• wherein the sensor includes a first sub-sensor configured to sense the first amount of light, a second sub-sensor configured to sense the second amount of light, and a third sub-sensor configured to sense the third amount of light, the first sub-sensor being spaced apart in a first direction along an incident direction of the main light comprising the first light, the second light, and the third light.