Vapor chamber with support structure
AssigneeDelta Electronics, Inc.
InventorsShih-Lin Huang, Sien Wu, Baoxun He, Ti-Jun Wang
Life of this patent
Estimating the term…
Abstract
A vapor chamber with a support structure is provided. The vapor chamber with the support structure includes a first plate, a second plate spaced apart from the first plate, and multiple support elements fixed between the first and second plates. On an outer surface of any of the first plate or the second plate, laser welding is performed on positions corresponding to the support elements so as to join the support elements to the first and second plates and to form weld ports on the outer surface of any of the plates. The invention solves the problem of fixing the support structure inside the thin vapor chamber, and therefore mass production can be realized.
Claims5
A vapor chamber with a support structure, comprising:
- a first plate including an outer surface and an inner surface, a periphery of the first plate including a sealing edge extending outwardly, and a level difference existing between a top portion and the sealing edge;
- a second plate, the second plate also including an outer surface and an inner surface, the inner surface of the second plate being spaced apart from the inner surface of the first plate, and the second plate covering the first plate to form a chamber;
- and;
- a plurality of support elements fixed in the chamber, the outer surface of the first plate and the outer surface of the second plate including a plurality of weld ports formed by laser welding, and the weld ports being disposed to form recessed weld ports without penetrating the first plate and the second plate and corresponding to the support elements, respectively;
- wherein, the vapor chamber has a thickness of 0.1 to 0.8 mm, each of the first and second plates has a thickness of 0.02 to 0.2 mm, and each of the support elements has a thickness of 0.025 to 0.25 mm.
Dependencies are inferred from the claim text.