Low-temperature hydrogen oxidation system
AssigneeToplus Energy Corporation
InventorsMing-Yu Yen, Hsu-Lin Chang, Fu-Yang Shih
Life of this patent
Estimating the term…
Abstract
The invention provides a low-temperature hydrogen oxidation system comprising at least one hydrogen oxidation device, at least one hydrogen reaction module is disposed in the hydrogen oxidation device, at least one hydrogen reaction channel is formed in the hydrogen reaction module and is provided with at least one catalyst, the hydrogen oxidation device is provided with at least one gas inlet channel and at least one gas outlet channel to communicate with the hydrogen reaction channel, at least one cooling channel is further formed in the hydrogen oxidation device; and at least one gas humidifying device disposed at a position of the gas inlet channel.
Claims8
A hydrogen oxidation system comprising:
- at least one hydrogen oxidation device, at least one hydrogen reaction module being disposed in the at least one hydrogen oxidation device, at least one hydrogen reaction channel being formed in the at least one hydrogen reaction module, the at least one hydrogen reaction module being provided with at least one catalyst in the at least one hydrogen reaction channel, the at least one hydrogen oxidation device being provided with at least one gas inlet channel and at least one gas outlet channel to communicate with the at least one hydrogen reaction channel, at least one cooling channel being further formed in the at least one hydrogen oxidation device;
- and
- at least one gas humidifying device comprising a spray, thin film, or bubble humidifier, disposed at a position of the at least one gas inlet channel, wherein after passing through the at least one gas humidifying device and the at least one hydrogen reaction channel, hydrogen in the hydrogen-containing air being catalytically oxidized by the at least one catalyst and discharged to reduce a hydrogen concentration;
- wherein the at least one hydrogen reaction module comprises a first isolation layer and a second isolation layer, and the at least one hydrogen reaction channel is defined by the first isolation layer and the second isolation layer;
- wherein the hydrogen oxidation devices are stacked on one another, a first outer end plate is disposed at a top of the stacked hydrogen oxidation devices, and a second outer end plate is disposed at a bottom of the stacked hydrogen oxidation devices;
- wherein one or both of the first isolation layer and the second isolation layer is a heat dissipation material, a heat dissipation plate, a metal plate, or a graphite plate body;
- wherein a first groove in a serpentine reentrant shape is formed on one side of the first isolation layer, the second isolation layer is disposed on the first groove, the at least one hydrogen reaction channel is defined in the first groove, a second groove in a serpentine reentrant shape is formed on another side of the second isolation layer opposite to the first groove, and the at least one cooling channel is formed in the second groove;
- and
- wherein the at least one catalyst is coated on inner sides of first grooves.
Dependencies are inferred from the claim text.