Semiconductor process equipment

A substrate processing system, comprising:

• a first processing line including a first process station arrangement including a plurality of first process stations including magnetic rails configured to move a first carrier in a first axial direction through and between each of the plurality of first process stations;
• a second processing line including a second process station arrangement including a plurality of second process stations including second magnetic rails configured to move a second carrier in the first axial direction through and between each of the plurality of second process stations;
• and
• a central arrangement of stations shared by the first processing line and the second processing line and disposed between the first process station arrangement and the second process station arrangement, wherein the central arrangement of stations includes:
• a plurality of stations, each of the plurality of stations including a magnetic levitation assembly configured to move the first carrier and the second carrier in the first axial direction and configured to move the first carrier and the second carrier in a second axial direction,
• wherein:
• the first processing line includes a first lift station at each end configured to selectively move the first carrier between a first conveyance plane and a second conveyance plane, wherein a first conveyance station is located at the second conveyance plane and configured to convey the first carrier in the second axial direction;
• and
• the second processing line includes a second lift station at each end configured to selectively move the second carrier between the first conveyance plane and the second conveyance plane, wherein a second conveyance station is located at the second conveyance plane and configured to convey the second carrier in the second axial direction.

A substrate processing system, comprising:

• a first processing line including a first process station arrangement including a plurality of first process stations including magnetic rails configured to move a first carrier in a first axial direction through and between each of the plurality of first process stations;
• a second processing line including a second process station arrangement including a plurality of second process stations including second magnetic rails configured to move a second carrier in the first axial direction through and between each of the plurality of second process stations;
• and
• a central arrangement of stations shared by the first processing line and the second processing line and disposed between the first process station arrangement and the second process station arrangement, wherein the central arrangement of stations includes:
• a plurality of stations, each of the plurality of stations including a magnetic levitation assembly configured to move the first carrier and the second carrier in the first axial direction and configured to move the first carrier and the second carrier in a second axial direction;
• a first lift station at a first end of the central arrangement of stations, wherein the first lift station is configured to selectively lift the first carrier and the second carrier from a first conveyance plane to a conveyance station located at a second conveyance plane above the central arrangement of stations;
• and
• a second lift station at a second end of the central arrangement of stations, wherein the second lift station is configured to selectively lower the first carrier and the second carrier from the second conveyance plane to the first conveyance plane,
• wherein the conveyance station is configured to convey the first carrier and the second carrier in the second axial direction.

A substrate processing system, comprising:

• a plurality of stations in a linear arrangement, wherein a substrate carrier is conveyable through and between the plurality of stations in a first linear direction of travel along a first conveyance plane along a plurality of magnetic rails, and wherein the substrate carrier is moveable between positions along the first linear direction of travel within each of the plurality of stations by the plurality of magnetic rails, wherein at least one of the plurality of stations comprises:
• a housing including a transport region and a process region, wherein at least two of the plurality of magnetic rails are disposed in the transport region and are configured to levitate and propel the substrate carrier;
• and
• a pedestal assembly comprising a pedestal disposed within the housing, wherein the pedestal is moveable between a substrate loading position and a process position,
• wherein the plurality of stations includes a lift station at each end configured to selectively move the substrate carrier between the first conveyance plane and a second conveyance plane, wherein the substrate carrier is conveyable along the second conveyance plane in a second linear direction of travel between the lift stations within at least one station disposed above the plurality of stations.