Wafer support table

A wafer support table comprising:

• a ceramic base having a wafer placement surface;
• and
• a plurality of heaters embedded in the ceramic base, wherein
• the ceramic base has a first heater formation surface, a second heater formation surface, and a third heater formation surface in a stated order from the wafer placement surface toward a surface opposite from the wafer placement surface,
• the plurality of heaters includes a first heater provided on the first heater formation surface, a second heater provided on the second heater formation surface, and a third heater provided on the third heater formation surface,
• the first heater is provided so as to be located at a center of the ceramic base,
• the second heater is provided so as to be located around a periphery of the first heater, and
• the third heater is provided so as to overlap the second heater and is provided in each of a plurality of zones divided from the third heater formation surface by a radial line segment, and
• wherein the first heater, the second heater, and the third heater each have a coil shape, and a second heater jumper is connected to a surface side opposite from the wafer placement surface with respect to a coil center of the second heater, and a third heater jumper is connected to a side closer to the wafer placement surface with respect to a coil center of the third heater,
• wherein the second heater jumper is not electrically connected to the third heater jumper, and
• wherein a distance from the third heater jumper to the surface side opposite from the wafer placement surface is greater than a distance from the second heater jumper to the wafer placement surface.