Etching device and etching method thereof

An etching method comprising:

• a loading operation of opening an etching chamber to place an object;
• a pressurization operation of pressurizing an inside of the etching chamber;
• a heating operation of, when a temperature of an etchant is less than or equal to a set temperature, heating the etchant to the set temperature or a temperature higher than the set temperature;
• an etching operation of supplying the etchant into the etching chamber to etch the object;
• a rinsing operation of supplying a rinsing liquid into the etching chamber to remove by-products and the etchant remaining on the object;
• a cleaning operation of supplying a cleaning liquid into the etching chamber to remove the rinsing liquid remaining on the object;
• and
• an unloading operation of opening the etching chamber to discharge the object to the outside,
• wherein the pressurization operation includes operating a first pressurizer to pressurize the etching chamber and an etchant supply container to a set pressure, and operating a second pressurizer to maintain a pressurization storage container, which accommodates the rinsing liquid and the cleaning liquid discharged from the etching chamber, in a pressurized atmosphere.