Display substrate and manufacturing method thereof, and display device

A display substrate, comprising:

• a base substrate;
• a pixel defining layer arranged at one side of the base substrate, the pixel defining layer being configured for defining a plurality of opening areas, and the pixel defining layer located between at least two adjacent opening areas comprising:
• a third defining portion and fourth defining portions located at two sides of the third defining portion, wherein a transmittance of the third defining portion is less than a transmittance of the fourth defining portion;
• and
• a common transport layer arranged at one side of the pixel defining layer away from the base substrate, comprising:
• a first blocking pattern and first transport patterns located at two sides of the first blocking pattern, a lateral resistance of the first blocking pattern being greater than a lateral resistance of the first transport pattern, wherein:
• an orthographic projection of the first blocking pattern on the base substrate is located within an orthographic projection range of the pixel defining layer on the base substrate, and an orthographic projection of the first blocking pattern on the base substrate covers an orthographic projection of the third defining portion on the base substrate;
• an orthographic projection of the first transport pattern on the base substrate covers orthographic projections of the at least two adjacent opening areas on the base substrate, and an orthographic projection of at least part of the pixel defining layer between the at least two adjacent opening areas on the base substrate;
• after the first blocking pattern is irradiated with laser, a thickness of the first blocking pattern is less than or equal to a thickness of the first transport pattern;
• and
• a mass percentage of oxygen in the first blocking pattern is higher than a mass percentage of oxygen in the first transport pattern.

A method for manufacturing a display substrate, comprising:

• providing a base substrate;
• forming a pixel defining layer at one side of the base substrate, the pixel defining layer being configured for defining a plurality of opening areas;
• forming a common transport layer at one side of the pixel defining layer away from the base substrate, the common transport layer comprising:
• a first blocking pattern and first transport patterns located at two sides of the first blocking pattern;
• wherein the first blocking pattern and the first transport pattern at least comprise one identical element, a material structure of the first blocking pattern is different from a material structure of the first transport pattern, and a lateral resistance of the first blocking pattern is greater than a lateral resistance of the first transport pattern;
• and
• an orthographic projection of the first blocking pattern on the base substrate is located within an orthographic projection range of the pixel defining layer on the base substrate, and an orthographic projection of the first transport pattern on the base substrate covers orthographic projections of at least two adjacent opening areas on the base substrate and an orthographic projection of at least part of the pixel defining layer between the at least two adjacent opening areas on the base substrate,
• wherein after the first blocking pattern is irradiated with laser, a thickness of the first blocking pattern is less than or equal to a thickness of the first transport pattern, and
• wherein a mass percentage of oxygen in the first blocking pattern is higher than a mass percentage of oxygen in the first transport pattern.