Asymmetric single-channel floating gate memristor
AssigneeTower Semiconductor Ltd.
InventorsEvgeny Pikhay, Michael Yampolsky, Yakov Roizin
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AssigneeTower Semiconductor Ltd.
InventorsEvgeny Pikhay, Michael Yampolsky, Yakov Roizin
Estimating the term…
A single-channel, single-poly floating gate (EEPROM-type) memristor including asymmetric source/drain-to-gate coupling and an asymmetric channel doping pattern. Asymmetric source/drain-to-gate coupling is achieved by configuring the drain, source and floating gate such that the gate-to-drain capacitance is greater than the gate-to-source capacitance. The asymmetric channel doping pattern is implemented by forming different drain-side and source-side doping portions (i.e., different N-type or P-type implant configurations and/or positions). The asymmetric channel doping pattern is preferably formed using standard CMOS implants (e.g., NLDD and P-type pocket implants). Multiple N-type and P-type implants may be selectively positioned to achieve a desired balance between program/erase speeds, reverse (read direction) threshold voltage and immunity to read-disturb and over-erase. A drain-side diode may be additionally used to suppress over-erase. A memory circuit including multiple two-terminal memristors disposed in a cross-point array is disclosed, which can be utilized, e.g., in a neuromorphic circuit.
A two-terminal memristor comprising:
A memory circuit comprising a plurality of two-terminal memristors fabricated on a semiconductor substrate and disposed in a cross-point array, each said memristor having a first terminal connected to an associated first line and a second terminal connected to an associated second line, wherein said each memristor comprises:
A neuromorphic circuit comprising a plurality of two-terminal memristors fabricated on a semiconductor substrate, each said memristor comprising:
Dependencies are inferred from the claim text.