Alignment determination method and computer program
AssigneeASML Netherlands B.V.
InventorsErwin Slot, Niels Vergeer, Vincent Sylvester Kuiper
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AssigneeASML Netherlands B.V.
InventorsErwin Slot, Niels Vergeer, Vincent Sylvester Kuiper
Estimating the term…
The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.
A method of determining alignment of electron optical components operable on a plurality of beamlets in a charged particle apparatus comprising:
A non-transitory computer readable medium that stores a set of instructions for determining alignment of electron optical components operable on a plurality of beamlets in a charged particle apparatus comprising:
Dependencies are inferred from the claim text.