Particle monitoring system, particle monitoring method, and monitoring device

A particle monitoring method of measuring a particle in a plasma processing apparatus by using a monitoring device,

• in which the monitoring device includes
• a plate-shaped base substrate, and
• a plurality of imaging devices having optical axes facing upward on the base substrate, and being disposed apart from each other, and
• the method comprising:
• placing the monitoring device on a stage in a chamber of the plasma processing apparatus;
• irradiating an inside of the chamber of the plasma processing apparatus with light;
• imaging scattered light from the particle irradiated with the light by the plurality of imaging devices;
• and
• discriminating the particle in an image captured by the plurality of imaging devices.

A particle monitoring system comprising:

• a plasma processing apparatus including a chamber and a stage disposed in the chamber;
• and
• a monitoring device for measuring a particle in a plasma processing apparatus, the monitoring device being in the chamber and comprising:
• a plate-shaped base substrate having a shape of a wafer and including a notch on an edge thereof for rotational alignment;
• a plurality of imaging devices having optical axes facing upward on the base substrate, and being disposed apart from each other to capture images including scattered light from the particle irradiated with light incident from a side surface of a chamber of the plasma processing apparatus;
• and
• a control device for discriminating the particle in the images captured by the plurality of imaging devices.