US 12,662,650 B2 · Surface treatment method to remove contaminated and implanted waveguide surface

Abstract

Embodiments of the present disclosure herein include a method of removing a contamination material from an optical device. The method may include disposing an optical device in a process chamber, the optical device having optical device structures formed in a substrate, the contamination material is disposed at least on sidewalls of the optical device structures and within trenches between the optical device structures, and exposing the optical device to a plasma generated in the process chamber, the plasma generated from oxygen gas (O2), chlorine gas (Cl2), Argon (Ar), or a combination thereof, the exposing the optical device to the plasma removes the contamination material.

Claims18

Dependent claims

A method of removing a contamination material from a waveguide, comprising:

disposing the waveguide in a process chamber, the waveguide comprising an input coupler comprising first optical device structures and an output coupler comprising second optical device structures, and the contamination material is disposed at least on sidewalls of the first optical device structures and the second optical device structures, and within trenches disposed between adjacent first optical device structures and adjacent second optical device structures;
and
exposing the waveguide to a plasma generated in the process chamber, the plasma generated from oxygen gas (O2), chlorine gas (Cl2), Argon (Ar), or a combination thereof, the exposing the waveguide to the plasma removing the contamination material.

Dependencies are inferred from the claim text.

Surface treatment method to remove contaminated and implanted waveguide surface

Life of this patent

Surface treatment method to remove contaminated and implanted waveguide surface

Life of this patent

Abstract

Claims18