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US 12,662,386 B2Granted
Hollow silica particles and method for producing the same
AssigneesAGC Inc., Agc Si-Tech Co., Ltd.
InventorsHiromichi Kamo, Masashi Kondo, Hajime Katayama
Life of this patent
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Abstract
The present invention relates to hollow silica particles, which each includes a shell layer containing silica and a space inside the shell layer, in which the hollow silica particles have a peak intensity derived from SiOH at a wavenumber of around 3,746 cm−1 of 0.60 or less by infrared spectroscopy, a relative permittivity at 1 GHz of from 1.3 to 5.0 and a dielectric loss tangent at 1 GHz of from 0.0001 to 0.05.
Claims12
Hollow silica particles, which each comprise a shell layer containing silica and a space inside the shell layer,
- wherein the hollow silica particles contain at least one metal M selected from the group consisting of Li, Na, K, Rb, Cs, Mg, Ca, Sr, and Ba,
- wherein a concentration of the metal M contained in the hollow silica particles is 50 mass ppm or more and 5 mass % or less, and
- wherein the hollow silica particles have a peak intensity derived from SiOH at a wavenumber of around 3,746 cm−1 of 0.60 or less by infrared spectroscopy, a relative permittivity at 1 GHz of from 1.3 to 5.0 and a dielectric loss tangent at 1 GHz of from 0.0001 to 0.05.
Dependencies are inferred from the claim text.