Multilayer articles including an absorbent layer and an ultraviolet mirror, systems, devices, and methods of disinfecting

A device comprising:

• a) a chamber, the chamber comprising at least one wall;
• b) a broadband UVC light source located within the chamber;
• c) an absorbent layer adjacent to the at least one wall of the chamber that absorbs at least 70 percent of incident visible light having a wavelength between at least 400 nm and 700 nm;
• and
• d) an ultraviolet mirror located within the chamber between the broadband UVC light source and the absorbent layer, wherein the ultraviolet mirror is comprised of at least a plurality of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, and collectively transmitting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from greater than 230 nanometers, greater than 235 nm, or greater than 240 nm, to 400 nanometers,
• wherein at least 50, 60, 70, 80, 90, or 95 percent of ultraviolet light having a wavelength between at least 230 nanometers and 400 nanometers transmitted through the ultraviolet mirror is absorbed in the chamber.

A method of disinfecting at least one material, the method comprising:

• a) obtaining a system comprising:
• a broadband UVC light source;
• and
• a multilayer article comprising:
• an absorbent layer that absorbs at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light having a wavelength between at least 230 nanometers and 400 nanometers the absorbent layer comprising a major surface;
• and
• an ultraviolet mirror adjacent to the major surface of the absorbent layer, wherein the ultraviolet mirror is comprised of at least a plurality of alternating first and second optical layers collectively reflecting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, and collectively transmitting at an incident light angle of at least one of 0°, 15°, 30°, 45°, 60°, or 75°, at least 50, 60, 70, 80, 90, or 95 percent of incident ultraviolet light in a wavelength range from greater than 230 nanometers, greater than 235 nm, or greater than 240 nm, to 400 nanometers;
• b) directing UVC light from the broadband UVC light source at the ultraviolet mirror;
• and
• c) exposing the at least one material to ultraviolet light in a wavelength range from 190 nanometers, 195 nm, or 200 nm, to 230 nanometers, 235 nm, or 240 nm, the ultraviolet light reflected by the ultraviolet mirror towards the at least one material,
• wherein the at least one material is exposed to 10, 8, 6, 5, 4, 3, 2, or 1 percent or less of ultraviolet light having a wavelength between greater than 230 nanometers, 235 nm, or 240 nm, and 400 nanometers that is emitted by the broadband UVC source.