Method for controlling temperature of substrate support and inspection apparatus
AssigneeTokyo Electron Limited
InventorsShigeru Kasai, Hiroyuki Nakayama, Yutaka Akaike, Hiroaki Komiya, Yoshiyasu Kato
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AssigneeTokyo Electron Limited
InventorsShigeru Kasai, Hiroyuki Nakayama, Yutaka Akaike, Hiroaki Komiya, Yoshiyasu Kato
Estimating the term…
A method for adjusting a temperature of a substrate support is provided. In an apparatus for inspecting a target device, a substrate placement surface of the substrate support is divided into multiple regions and a heater is disposed in each of the multiple regions. The method comprises controlling the heater in a main region corresponding to the target device such that a temperature of the main region becomes a set temperature, and controlling the heater in a sub-region adjacent to the main region. When overshoot has not occurred in the temperature of the main region, the heater in the sub-region is controlled such that a temperature difference between the main region and the sub-region becomes a predetermined value, and when overshoot has occurred, the heater of the sub-region is controlled such that a difference between the set temperature and the temperature in the sub-region becomes the predetermined value.
A method for controlling a temperature of a substrate support, on which a substrate is placed, during inspecting devices formed on the substrate,
An inspection apparatus for inspecting devices formed on a substrate, comprising:
Dependencies are inferred from the claim text.