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US 12,658,471 B2Granted
Method for producing halide
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsTakashi Kubo, Kazufumi Miyatake, Yohei Hayashi, Yusuke Nishio, Akihiro Sakai
Life of this patent
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Abstract
A production method for producing a halide, the method includes a heat treatment step of heat-treating a mixed material containing (NH4)aYα3+a, (NH4)bGdβ3+b, Liγ, and Caδ2 in an inert gas atmosphere, wherein α, β, γ, and δ are each independently at least one selected from the group consisting of F, Cl, Br, and I, and the formulas: 0≤a≤3, 0≤b≤3, and 0<a+b≤6, are satisfied.
Claims10
A production method for producing a halide, the method comprising:
- heat-treating a mixed material containing (NH4)aYα3+a, (NH4)bGdβ3+b, Liγ, and Caδ2 in an inert gas atmosphere,
- wherein α, β, γ, and δ are each independently at least one selected from the group consisting of F, Cl, Br, and I, and
- the following three formulas:
- 0≤a≤3,
- 0≤b≤3, and
- 0<a+b≤6,
- are satisfied.
4 more elements
Dependencies are inferred from the claim text.