Metallization method
AssigneesDupont Electronic Materials International, LLC, Rohm and Haas Electronic Materials LLC
InventorsMitsuru Haga, Cong Liu, James F. Cameron
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Abstract
Disclosed herein is a metallization method, comprising (a) providing a photoresist layer on a first surface of a substrate, wherein the photoresist layer is formed from a photoresist composition comprising: a polymer comprising acid-labile groups; a photoacid generator; an organic phosphonic acid; and a solvent; (b) pattern-wise exposing the photoresist layer to activating radiation; (c) developing the exposed photoresist layer with a basic developer to form a photoresist pattern; and (d) after forming the photoresist pattern, plating a metal on the first surface of the substrate using the photoresist pattern as a plating mask.
Claims11
A metallization method, comprising:
- (a) providing a photoresist layer on a first surface of a substrate, wherein the photoresist layer is formed from a photoresist composition comprising:
- a polymer comprising acid-labile groups;
- a photoacid generator;
- an organic phosphonic acid;
- a solvent;
- and a basic compound;
- (b) pattern-wise exposing the photoresist layer to activating radiation;
- (c) developing the exposed photoresist layer with a basic developer to form a photoresist pattern;
- and
- (d) after forming the photoresist pattern, plating a metal on the first surface of the substrate using the photoresist pattern as a plating mask, wherein the organic phosphonic acid is selected from the group consisting of butyl phosphonic acid, pentyl phosphonic acid, hexyl phosphonic acid, octyl phosphonic acid, n-decyl phosphonic acid, n-dodecylphosphonic acid, n-hexadecylphosphonic acid, n-hexylphosphonic acid, n-octadecylphosphonic acid, n-octylphosphonic acid, n-tetradecylphosphonic acid, phenyl phosphonic acid, benzylphosphonic acid, (4-aminobenzyl) phosphonic acid (4-aminophenyl) phosphonic acid, (4-hydroxyphenyl) phosphonic acid, benzhydryl phosphonic acid, (2-phenylethyl) phosphonic acid, 4-methoxyphenyl phosphonic acid, (pyridin-3-ylmethyl) phosphonic acid, or a combination thereof, and
- wherein the basic compound is selected from the group consisting of 2,8-dimethyl-6H,12H-5,11-methanodibenzo [b,f][1,5]diazocine (Troger's Base), ethyl-3-(morpholino) propionate, 4-(p-tolyl) morpholine, or a combination thereof.
Dependencies are inferred from the claim text.