Electrostatic field strength measurement
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing Da Yang, Yi-Chen Li, Chun-Hsuan Lin
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing Da Yang, Yi-Chen Li, Chun-Hsuan Lin
Estimating the term…
An apparatus is provided. The apparatus includes a laser generation device configured to emit a laser signal to a semiconductor fabrication component. The apparatus includes a reflection detection device configured to receive a reflection signal comprising light, of the laser signal, reflected by a surface of the semiconductor fabrication component. The reflection detection device includes an optical filter. The optical filter is configured to block light, of the reflection signal, that has a wavelength outside a defined range of wavelengths. The optical filter is configured to provide filtered light, from the reflection signal, that has a wavelength within the defined range of wavelengths. The reflection detection device includes a light sensor configured to generate an electrical signal based upon the filtered light. The apparatus includes a computer configured to determine, based upon the electrical signal, measures of electrostatic field strength at the surface of the semiconductor fabrication component.
An apparatus, comprising:
A method, comprising:
A semiconductor processing method, comprising:
Dependencies are inferred from the claim text.