Method of evaluating primary optical system of electron beam observation device, evaluation device used therefor, and method of manufacturing same
AssigneeEbara Corporation
InventorsKenji Watanabe, Takeshi Murakami, Yasushi Toma, Ryo Tajima, Tsutomu Karimata
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Abstract
Provided is a method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam.
Claims8
A method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam, the method comprising the steps of:
- irradiating an irradiation target with a primary electron beam generated by a multiple beam generation mechanism provided with a plurality of openings, and acquiring a first image formed by a secondary electron beam from the irradiation target, the first image including a plurality of first patterns each of which corresponding to each of the openings provided in the multiple beam generation mechanism;
- calculating a first deviation amount between a position of each of the first patterns in the first image and a first target position of the first pattern;
- irradiating with light a plurality of photoelectric converters each of which corresponding to each of the plurality of openings provided in the multiple beam generation mechanism and installed on a stage of the electron beam observation device, and acquiring a second image formed by an electron beam from the photoelectric converters, the second image including a plurality of second patterns each of which corresponding to each of the photoelectric converters;
- calculating a second deviation amount between a position of each of the second patterns in the second image and a second target position of the second pattern;
- and
- obtaining a deviation of a trajectory of the primary electron beam in the primary optical system based on the first deviation amount and the second deviation amount.
A method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam, the method comprising the steps of:
- irradiating an irradiation target with a primary electron beam from a plurality of electron sources, and acquiring a first image formed by a secondary electron beam from the irradiation target, the first image including a plurality of first patterns each of which corresponding to each of arrangements of the plurality of electron sources;
- calculating a first deviation amount between a position of each of the first patterns in the first image and a first target position of the first pattern;
- irradiating with light a plurality of photoelectric converters installed on a stage of the electron beam observation device and each corresponding to the arrangement of the plurality of electron sources, and acquiring a second image formed by an electron beam from the photoelectric converters, the second image including a plurality of second patterns each of which corresponding to each of the photoelectric converters;
- calculating a second deviation amount between a position of each of the second patterns in the second image and a second target position of the second pattern;
- and
- obtaining a deviation of a trajectory of the primary electron beam in the primary optical system based on the first deviation amount and the second deviation amount.
Dependencies are inferred from the claim text.