Capacitive sensor system for precursor level measurement and method therefor
AssigneeASM IP Holding B.V.
InventorVincent Vandalon
Life of this patent
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Abstract
In the present description, a capacitive sensor system is described by means of which the amount of solid precursor in a precursor vessel for a semiconductor manufacturing process can be determined and to a method for using the same. The system comprises at least two electrodes that are arranged in a substantially parallel manner within the precursor vessel.
Claims20
Method for determining an amount of solid precursor in a precursor vessel for a semiconductor manufacturing process, wherein the vessel has an interior portion configured for receiving and holding the solid precursor, comprising at least two electrodes that are arranged in a substantially parallel manner within the vessel, the method comprising the steps of:
- applying an electrical signal to each one of the electrodes to electrically excite each electrode such that an electric field is formed inside the interior portion of the vessel;
- capturing sensing data indicative of capacitance related to an amount of precursor within the electric field;
- and
- determining, based on the sensing data, the amount of precursor in the precursor vessel,
- wherein determining the amount of precursor in the precursor vessel comprises determining, based on the sensing data, a fraction of the interior portion of the vessel which contains precursor.
Capacitive sensor system for measuring an amount of solid precursor in a precursor vessel for a semiconductor manufacturing process, the vessel having an interior portion configured for receiving and holding the solid precursor, the system comprising:
- at least two electrodes configured to be mountable within the interior portion in a substantially parallel manner;
- a controller configured to apply an electrical signal to each one of the electrodes to electrically excite each electrode such that an electric field is formed inside the interior portion of the vessel, and capture sensing data indicative of capacitance related to an amount of precursor within the electric field;
- and
- a processing device communicatively coupled to the controller in order to receive the sensing data therefrom, and configured to determine, based on the sensing data, the amount of precursor in the precursor vessel which includes being configured to determine, based on the sensing data, a fraction of the interior portion of the vessel which contains precursor.
Processing system comprising a process chamber, a substrate handling system, and a precursor vessel, wherein
- the precursor vessel has an interior portion holding an amount of solid precursor;
- and
- the processing system comprises a capacitive sensor system comprising:
- at least two electrodes configured to be mountable within the interior portion in a substantially parallel manner;
- a controller configured to apply an electrical signal to each one of the electrodes to electrically excite each electrode such that an electric field is formed inside the interior portion of the vessel, and capture sensing data indicative of capacitance related to an amount of precursor within the electric field;
- and
- a processing device communicatively coupled to the controller in order to receive the sensing data therefrom, and configured to determine, based on the sensing data, the amount of precursor in the precursor vessel.
Dependencies are inferred from the claim text.