Metrology system with position and orientation tracking utilizing patterns of light beams

A method for operating a metrology system including a light beam source configuration, the method comprising:

• operating the light beam source configuration to direct a first pattern of light beams and a second pattern of light beams to light beam sensors of a sensor configuration to indicate a position and orientation of the light beam source configuration, wherein:
• the light beam source configuration is coupled to at least one of an end tool or an end tool mounting configuration of a movement system that moves the end tool;
• the position and orientation of the light beam source configuration are indicative of a position and orientation of the end tool;
• the sensor configuration comprises a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position;
• at least some of the light beams that are directed to and received at the light beam sensors produce measurement spots in positions on the light beam sensors that cause the light beam sensors to produce corresponding measurement signals;
• and
• the first pattern of light beams has a lower density of first pattern light beams in relation to the second pattern of light beams which has a higher density of second pattern light beams;
• and
• processing the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration, wherein:
• for at least a first position of the light beam source configuration that is a first distance from the first light beam sensor and a second distance from the second light beam sensor, with the second distance being greater than the first distance:
• one or more first pattern light beams that are directed toward the first light beam sensor are utilized to cause the first light beam sensor to produce measurement signals for the processing to determine the position and orientation, and second pattern light beams that are directed toward the first light beam sensor are not utilized to cause the first light beam sensor to produce measurement signals for the processing to determine the position and orientation;
• and
• one or more second pattern light beams that are directed toward the second light beam sensor are utilized to cause the second light beam sensor to produce measurement signals for the processing to determine the position and orientation.

A metrology system, comprising:

• a sensor configuration comprising a plurality of light beam sensors located at fixed positions, including at least a first light beam sensor at a first position and a second light beam sensor at a second position;
• a light beam source configuration that is configured to direct a first pattern of light beams and a second pattern of light beams to the light beam sensors of the sensor configuration to indicate a position and orientation of the light beam source configuration, wherein:
• the light beam source configuration is configured to be coupled to at least one of an end tool or an end tool mounting configuration of a movement system that moves the end tool;
• the position and orientation of the light beam source configuration are indicative of a position and orientation of the end tool;
• at least some of the light beams that are directed to and received at the light beam sensors are configured to produce measurement spots in positions on the light beam sensors that cause the light beam sensors to produce corresponding measurement signals;
• and
• the first pattern of light beams has a lower density of first pattern light beams in relation to the second pattern of light beams which has a higher density of second pattern light beams;
• and
• a processing portion configured to process the measurement signals from the light beam sensors of the sensor configuration to determine a position and orientation of the light beam source configuration,
• wherein the metrology system is configured such that for at least a first position of the light beam source configuration that is a first distance from the first light beam sensor and a second distance from the second light beam sensor, with the second distance being greater than the first distance:
• one or more first pattern light beams that are directed toward the first light beam sensor are utilized to cause the first light beam sensor to produce measurement signals for the processing by the processing portion, and second pattern light beams that are directed toward the first light beam sensor are not utilized to cause the first light beam sensor to produce measurement signals for the processing by the processing portion;
• and
• one or more second pattern light beams that are directed toward the second light beam sensor are utilized to cause the second light beam sensor to produce measurement signals for the processing by the processing portion.