Injection module for a process chamber

A process chamber, comprising:

• a chamber body comprising a sidewall portion;
• a chamber base coupled to the chamber body;
• an annular channel formed in the chamber body and disposed around the chamber base, the annular channel comprising an outer wall and an inner wall;
• a rotatable substrate support disposed inside a process volume of the chamber body, the substrate support configured to support a single substrate and have a rotational spin rate;
• a window disposed on the sidewall portion above the rotatable substrate support;
• a rapid annealing lamp assembly disposed over the window and the rotatable substrate support;
• an inlet port formed in the sidewall portion of the chamber body;
• and
• an injection module coupled to the inlet port, the injection module having:
• a body;
• one or more gas inlets coupled to the body;
• and
• a plurality of nozzles formed in a supply face of the body, each nozzle of the plurality of nozzles located on the same horizontal plane with one another and parallel with and upper surface of the rotatable substrate support, the supply face configured to face inside the chamber body, and gas exiting from the injection module configured to have a flow rate;
• and
• a controller configured to operate the process chamber such that the ratio of the flow rate to the rotational spin rate is between about ⅓ meters per second/Hertz and 3 meters per second/Hertz.

A process chamber, comprising:

• a chamber body comprising a sidewall portion and a lower portion;
• a chamber base coupled to the chamber body;
• an annular channel formed in the chamber body and disposed around the chamber base, the annular channel comprising an outer wall and an inner wall;
• a rotatable substrate support disposed inside a process volume of the chamber body, the substrate support configured to support a single substrate and have a rotational spin rate;
• a window disposed on the sidewall portion above the rotatable substrate support;
• a rapid annealing lamp assembly disposed over the window and the rotatable substrate support;
• an inlet port formed in the chamber body;
• a conduit for conveying gases into the process volume through the inlet port;
• and
• an injection module coupled between the inlet port and the conduit, the injection module having:
• a body;
• one or more gas inlets coupled to the body;
• and
• a plurality of nozzles formed in a supply face of the body, each nozzle of the plurality of nozzles located on the same horizontal plane with one another and parallel with an upper surface of the rotatable substrate support, the supply face configured to face inside the chamber body, and gas exiting from the injection module configured to have a flow rate;
• and
• a controller configured to operate the process chamber such that the ratio of the flow rate to the rotational spin rate is between about ⅓ meters per second/Hertz and 3 meters per second/Hertz.