Compound, CMP slurry composition including the same and polishing method using the same

A CMP slurry composition, comprising:

• a polar solvent or a non-polar solvent;
• an abrasive agent;
• and
• a corrosion inhibitor,
• wherein the corrosion inhibitor includes a compound represented by Formula 1, or a salt thereof,
• wherein, in Formula 1,
• AZ1 and AZ2 are each independently a substituted or unsubstituted azole-containing heterocyclic group;
• R1 and R2 are each independently hydrogen, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C7 to C20 arylalkyl group, or a substituted or unsubstituted C3 to C20 heteroaryl group;
• and
• n and m are each independently an integer of 0 to 2.