Formation of pores in atomically thin layers
AssigneesMassachusetts Institute of Technology, King Fahd University of Petroleum and Minerals
InventorsPiran Kidambi, Ahmed Ibrahim, Tahar Laoui, Jing Kong, Rohit N. Karnik, Sui Zhang
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Abstract
Atomically thin layers including pores, their method of manufacture, and their use are disclosed. In some embodiments, pores may be formed in an atomically thin layer by growing the atomically thin layer on exposed portions of a substrate that includes islands comprising a material that is different than the material of the substrate. In some embodiments, pores and/or defects may be formed in an atomically thin layer by employing growth conditions that promote the formation of defects and/or pores. In certain embodiments, pores and/or defects may be etched to enlarge their size.
Claims15
An article comprising:
- a substrate comprising a first material;
- a plurality of islands formed on the substrate, wherein the plurality of islands comprises a second material that is a product of the first material;
- and
- an atomically thin layer disposed on a portion of the substrate comprising the first material,
- wherein the plurality of islands extend past the atomically thin layer in a direction directed away from the substrate.
Dependencies are inferred from the claim text.