Processing liquid providing apparatus and substrate treating system including the same

An apparatus for providing substrate processing liquid comprising:

• a storage tank for storing substrate processing liquid;
• and
• a plurality of partition walls installed inside the storage tank and for dividing an internal space of the storage tank,
• wherein the apparatus is connected to a substrate processing apparatus for discharging the substrate processing liquid onto a substrate to provide the substrate processing liquid to the substrate processing apparatus,
• wherein the plurality of partition walls includes a plurality of holes formed passing through one surface and an other surface of the plurality of partition walls, and
• wherein at least one of the plurality of partition walls includes a margin region, in which the plurality of holes are not formed, and an upper part of the margin region positioned above the plurality of holes is larger than a side part of the margin region positioned on a left or right of the plurality of holes.