Slurry dispersion system with real time control

A method for feedback controlling a slurry dispersion system, the slurry dispersion system having a slurry source system, a reactor and a slurry supply system, the slurry source system configured to store an undiluted slurry and transport the undiluted slurry to the reactor, the reactor configured to mix the undiluted slurry with at least one chemical to obtain a mixed slurry and transport the mixed slurry to the slurry supply system, the slurry supply system configured to store the mixed slurry and output the mixed slurry for a chemical mechanical polishing (CMP) process, and the slurry supply system including a filter configured to filter the mixed slurry, the method comprising:

• sampling the mixed slurry to obtain a sampled slurry;
• determining whether a large particle count (LPC) value of the sampled slurry is greater than a first predetermined threshold;
• in response to determining that the LPC value is greater than the first predetermined threshold, performing a filtering operation on the mixed slurry, wherein the filtering operation comprises circulating the mixed slurry between a supply tank of the slurry supply system and the filter by using a first pump downstream of the supply tank and upstream of the filter, wherein the filter is upstream of the supply tank;
• and
• transporting the mixed slurry to a CMP tool by using a second pump downstream of the supply tank and upstream of the CMP tool, wherein the second pump is independent of the first pump.

A method for feedback controlling a slurry dispersion system, the slurry dispersion system having a slurry source system, a reactor and a slurry supply system, the slurry source system configured to store an undiluted slurry and transport the undiluted slurry to the reactor, the reactor configured to mix the undiluted slurry with at least one chemical to obtain a mixed slurry and transport the mixed slurry to the slurry supply system, the slurry supply system configured to store the mixed slurry and output the mixed slurry for a chemical mechanical polishing (CMP) process, and the slurry supply system including a filter configured to filter the mixed slurry, the method comprising:

• sampling the mixed slurry to obtain a sampled slurry;
• determining whether a large particle count (LPC) value of the sampled slurry is greater than a first predetermined threshold;
• in response to determining that the LPC value is greater than the first predetermined threshold, turning on the filter;
• circulating the mixed slurry between a supply tank of the slurry supply system and the filter by using a first pump downstream of the supply tank and upstream of the filter, wherein the filter is upstream of the supply tank;
• and
• transporting the mixed slurry to a CMP tool by using a second pump downstream of the supply tank and upstream of the CMP tool, wherein the second pump is independent of the first pump.